• DocumentCode
    322235
  • Title

    Acoustic reflection coefficient of silicon wafers in megasonic cleaning tanks

  • Author

    Zang, Ming ; Kittelson, D.B. ; Kuehn, T.H. ; Gouk, R.

  • Author_Institution
    Dept. of Mech. Eng., Minneapolis Univ., Minneapolis, MN, USA
  • Volume
    1
  • fYear
    1997
  • fDate
    5-8 Oct 1997
  • Firstpage
    833
  • Abstract
    Reflection coefficients of silicon wafers in megasonic cleaning tanks have been determined theoretically and experimentally. The experimental results obtained indicate that the model of a layered solid in liquids is a good predictor of reflection coefficients for silicon wafers in liquids. At a frequency of about 1 MHz, high reflection from silicon wafers occurs at large incident angles. There are also two troughs of low reflection for incident angles between 0°-90°. The Young´s modulus and Poisson´s ratio of the silicon (110) orientation give the best agreement between the model and experimental results
  • Keywords
    Poisson ratio; Young´s modulus; acoustic wave reflection; elemental semiconductors; silicon; ultrasonic cleaning; 1 MHz; Poisson´s ratio; Si; Young´s modulus; acoustic reflection coefficient; incident angle; layered solid; megasonic cleaning tanks; silicon wafers; Acoustic reflection; Aluminum; Cleaning; Frequency; Glass; Liquids; Semiconductor device modeling; Silicon; Solid modeling; Underwater acoustics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 1997. Proceedings., 1997 IEEE
  • Conference_Location
    Toronto, Ont.
  • ISSN
    1051-0117
  • Print_ISBN
    0-7803-4153-8
  • Type

    conf

  • DOI
    10.1109/ULTSYM.1997.663142
  • Filename
    663142