ZnO based thin-film transistor with high-κ gadolinium and praseodymium oxide as gate dielectric

In this work, we compare the electrical and radio frequency characteristics of top-gate ZnO TFTs with praseodymium oxide layer (Pr₂O₃) and Gadolinium oxide layer (Gd₂O₃). The source/drain region of ZnO thin-film transistor is treated by simple O₂ plasma instead of complicated processes, such as ion implantation and activation. By O₂ plasma treatment, the source/drain series resistance successfully reduced. With Pr₂O₃ and Gd₂O₃, high dielectric constant (high-κ) insulator gate dielectrics, gate leakage current, On/OFF current ratio, and radio frequency performance successfully improved to their use for portable, battery powered, and circuit design applications. The coupling of the gate electric field is enhanced by using high-κ gate dielectrics.