• DocumentCode
    3226469
  • Title

    Scaling study of graphene transistors

  • Author

    Yoon, Youngki ; Nikonov, Dmitri E. ; Salahuddin, Sayeef

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
  • fYear
    2011
  • fDate
    15-18 Aug. 2011
  • Firstpage
    1568
  • Lastpage
    1571
  • Abstract
    By performing rigorous self-consistent atomistic quantum transport simulations, scaling behavior of graphene-based MOSFET and TFET are investigated. We show that phonon scattering can negatively affect the on-current and transconductance of a MOSFET significantly, and therefore on-state characteristics can be improved by reducing the channel length down to 30 nm. For a TFET, however, off-state characteristics are very susceptible to phonon scattering, and off-current can increase by 6 orders of magnitude in a 30-nm-channel TFET. In contrast to what is predicted in the ballistic picture, the minimum leakage current and subthreshold swing of a TFET do not monotonically decreased by increasing channel length, but saturate for a channel length longer than 20 nm.
  • Keywords
    MOSFET; quantum optics; TFET; graphene transistor; graphene-based MOSFET; off-state characteristics; on-current; on-state characteristics; phonon scattering; self-consistent atomistic quantum transport simulation; size 30 nm; transconductance; Leakage current; Logic gates; MOSFET circuits; Phonons; Scattering; Transistors; Tunneling; Graphene; NEGF; Phonon Scattering; Quantum Simulation; Scaling; Transistor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
  • Conference_Location
    Portland, OR
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4577-1514-3
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2011.6144418
  • Filename
    6144418