DocumentCode
3227929
Title
Fabrication and characterization of half-kerfed LiNbO3 -based high-frequency (>100MHz) ultrasonic array transducers
Author
Zhang, J.Y. ; Xu, W.J. ; Carlier, J. ; Ji, X.M. ; Nongaillard, B. ; Queste, S. ; Zhou, J. ; Huang, Y.P.
Author_Institution
Dept. Opto-Acousto-Electron., Univ. de Valenciennes Mont Houy, Valenciennes, France
fYear
2011
fDate
18-21 Oct. 2011
Firstpage
1727
Lastpage
1730
Abstract
The effect of kerf depth is investigated on the performances of array transducers. A finite element tool, COMSOL, is employed to simulate the properties of acoustic field and to calculate the electrical properties of the arrays, including crosstalk effect and electrical impedance. Furthermore, Inductively Coupled Plasma (ICP) deep etching process is used to etch 36°/Y-cut lithium niobate (LiNbO3) crystals and the limitation of etching aspect ratio is studied. Several arrays with different profiles are realized under optimized processes. At last, arrays with different pitches are fabricated and characterized by a network analyzer.
Keywords
electric impedance; finite element analysis; lithium compounds; sputter etching; ultrasonic transducer arrays; COMSOL; LiNbO3; acoustic field properties; crosstalk effect; electrical impedance; electrical properties; finite element tool; half-kerfed high-frequency ultrasonic array transducers; inductively-coupled plasma deep etching; kerf depth effect; lithium niobate crystals; Acoustics; Arrays; Crosstalk; Etching; Finite element methods; Focusing; Lithium niobate;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2011 IEEE International
Conference_Location
Orlando, FL
ISSN
1948-5719
Print_ISBN
978-1-4577-1253-1
Type
conf
DOI
10.1109/ULTSYM.2011.0431
Filename
6293300
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