• DocumentCode
    3227929
  • Title

    Fabrication and characterization of half-kerfed LiNbO3-based high-frequency (>100MHz) ultrasonic array transducers

  • Author

    Zhang, J.Y. ; Xu, W.J. ; Carlier, J. ; Ji, X.M. ; Nongaillard, B. ; Queste, S. ; Zhou, J. ; Huang, Y.P.

  • Author_Institution
    Dept. Opto-Acousto-Electron., Univ. de Valenciennes Mont Houy, Valenciennes, France
  • fYear
    2011
  • fDate
    18-21 Oct. 2011
  • Firstpage
    1727
  • Lastpage
    1730
  • Abstract
    The effect of kerf depth is investigated on the performances of array transducers. A finite element tool, COMSOL, is employed to simulate the properties of acoustic field and to calculate the electrical properties of the arrays, including crosstalk effect and electrical impedance. Furthermore, Inductively Coupled Plasma (ICP) deep etching process is used to etch 36°/Y-cut lithium niobate (LiNbO3) crystals and the limitation of etching aspect ratio is studied. Several arrays with different profiles are realized under optimized processes. At last, arrays with different pitches are fabricated and characterized by a network analyzer.
  • Keywords
    electric impedance; finite element analysis; lithium compounds; sputter etching; ultrasonic transducer arrays; COMSOL; LiNbO3; acoustic field properties; crosstalk effect; electrical impedance; electrical properties; finite element tool; half-kerfed high-frequency ultrasonic array transducers; inductively-coupled plasma deep etching; kerf depth effect; lithium niobate crystals; Acoustics; Arrays; Crosstalk; Etching; Finite element methods; Focusing; Lithium niobate;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2011 IEEE International
  • Conference_Location
    Orlando, FL
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4577-1253-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2011.0431
  • Filename
    6293300