CMOS friendly MEMS manufacturing process

Author

Hunter, J. ; Bruner, M. ; Berger, J.

Author_Institution

Silicon Light Machines, Sunnyvale, CA, USA

fYear

1998

fDate

20-24 July 1998

Abstract

This paper describes a novel approach to manufacturing technology of optical MEMS devices. The devices are manufactured at a local foundry using fully CMOS compatible front-end processes complemented by unique release and seal processing steps. The paper will cover the process flow, technological challenges and process control issues related to this unique approach.

Keywords

CMOS integrated circuits; electrostatic actuators; light valves; micro-optics; micromachining; optical fabrication; optical projectors; process control; semiconductor device packaging; spatial light modulators; sputter etching; 1D array; CMOS friendly; MEMS manufacturing process; borderless array of pixels; electrically actuated phase grating; fully CMOS compatible front-end process; light modulator; light valve; local foundry; optical MEMS devices; plasma etching; polysilicon; process control issues; process flow; projection displays; release and seal processing steps; technological challenges; CMOS process; CMOS technology; Foundries; Manufacturing processes; Microelectromechanical devices; Micromechanical devices; Optical devices; Paper technology; Pulp manufacturing; Seals;

fLanguage

English

Publisher

ieee

Conference_Titel

Broadband Optical Networks and Technologies: An Emerging Reality/Optical MEMS/Smart Pixels/Organic Optics and Optoelectronics. 1998 IEEE/LEOS Summer Topical Meetings

Conference_Location

Monterey, CA, USA

Print_ISBN

0-7803-4953-9

Type

conf

DOI

10.1109/LEOSST.1998.689855

Filename

689855