DocumentCode :
3236001
Title :
Dynamic decomposition of arced SF6 by-products on activated alumina
Author :
Rochefort, A. ; Lussier, T. ; Fréchette, M.F. ; Larocque, R.Y.
Author_Institution :
Lignes aeriennes, Technol. et IREQ, Varennes, Que., Canada
Volume :
2
fYear :
1996
fDate :
20-23 Oct 1996
Firstpage :
634
Abstract :
The dynamic interaction of SOF2 with activated alumina has been studied at 298 K in adsorption experiments. The SOF2 adsorption process occurs in three distinct regimes related to the available adsorption sites on alumina. The first regime is an adsorption-reaction process where the change observed in the gas phase is essentially a sharp decrease in the amount of SOF2. During the SOF2 adsorption on alumina, an important fraction of the adsorbed phase is converted into SO2. On saturation of the alumina surface with SOF2, the amount of desorbing SO2 starts to increase in the gas phase as the amount of SOF2 decreases. This second regime is characterized by a competitive adsorption-desorption process which involves the adsorption of SOF2 simultaneously with the desorption of SO2 from a same site. The last regime consists of stabilization in the production of SO 2 in the gas phase, which could correspond to its equilibrium with the SO2-SOF2 adsorbed mixture. The typical SOF2 adsorption curve is well described by a Langmuir-type adsorption (type I) which gives an adsorption coefficient ka/kd≈0.4 h-1
Keywords :
SF6 insulation; adsorption; alumina; arcs (electric); decomposition; desorption; electric breakdown; surface chemistry; surface phenomena; 298 K; Al2O3; Langmuir-type adsorption; SF6; SO2; SO2-SOF2; SO2-SOF2 adsorbed mixture; SOF2; SOF2 adsorption process; activated alumina; adsorption coefficient; adsorption-reaction process; alumina surface saturation; arced SF6 by-products; competitive adsorption-desorption process; dynamic decomposition; dynamic interaction; gas phase; gas-insulated apparatus; moisture; Cables; Hafnium; Kinetic theory; Phase estimation; Production; Sampling methods; Sealing materials; Seals; Sulfur hexafluoride; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1996., IEEE 1996 Annual Report of the Conference on
Conference_Location :
Millbrae, CA
Print_ISBN :
0-7803-3580-5
Type :
conf
DOI :
10.1109/CEIDP.1996.564551
Filename :
564551
Link To Document :
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