DocumentCode
3236503
Title
An integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional suspension
Author
Qu, Hongwei ; Fang, Deyou ; Xie, Huikai
Author_Institution
Dept. of Electr. & Comput. Eng., Oakland Univ., Rochester, MI
fYear
2008
fDate
6-9 Jan. 2008
Firstpage
1063
Lastpage
1066
Abstract
This paper presents an integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional sensing element. The sidewall capacitors formed by multiple CMOS interconnect metal layers are exploited for fully differential displacement sensing with a common-centroid wiring configuration. A deep reactive ion etching (DRIE) based micro-fabrication process with large processing tolerance has been developed to allow robust sensor structures and high fabrication yield. With a monolithically integrated low-power, low-noise, dual-chopper amplifier which has a measured 44.5 dB gain and 1 mW power consumption, the fabricated integrated z-axis accelerometer demonstrates a sensitivity of 320 mV/g and an overall noise floor of 110 mug/radicHz.
Keywords
CMOS integrated circuits; accelerometers; micromechanical devices; sputter etching; CMOS-MEMS Z-axis accelerometer; deep reactive ion etching; differential displacement sensing; gain 44.5 dB; multiple CMOS interconnect metal layer; power 1 mW; torsional sensing element; Accelerometers; Capacitors; Etching; Fabrication; Gain measurement; Low-noise amplifiers; Noise measurement; Noise robustness; Power measurement; Wiring; CMOS-MEMS; accelerometer; torsional; z-axis;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location
Sanya
Print_ISBN
978-1-4244-1907-4
Electronic_ISBN
978-1-4244-1908-1
Type
conf
DOI
10.1109/NEMS.2008.4484502
Filename
4484502
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