• DocumentCode
    3236503
  • Title

    An integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional suspension

  • Author

    Qu, Hongwei ; Fang, Deyou ; Xie, Huikai

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Oakland Univ., Rochester, MI
  • fYear
    2008
  • fDate
    6-9 Jan. 2008
  • Firstpage
    1063
  • Lastpage
    1066
  • Abstract
    This paper presents an integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional sensing element. The sidewall capacitors formed by multiple CMOS interconnect metal layers are exploited for fully differential displacement sensing with a common-centroid wiring configuration. A deep reactive ion etching (DRIE) based micro-fabrication process with large processing tolerance has been developed to allow robust sensor structures and high fabrication yield. With a monolithically integrated low-power, low-noise, dual-chopper amplifier which has a measured 44.5 dB gain and 1 mW power consumption, the fabricated integrated z-axis accelerometer demonstrates a sensitivity of 320 mV/g and an overall noise floor of 110 mug/radicHz.
  • Keywords
    CMOS integrated circuits; accelerometers; micromechanical devices; sputter etching; CMOS-MEMS Z-axis accelerometer; deep reactive ion etching; differential displacement sensing; gain 44.5 dB; multiple CMOS interconnect metal layer; power 1 mW; torsional sensing element; Accelerometers; Capacitors; Etching; Fabrication; Gain measurement; Low-noise amplifiers; Noise measurement; Noise robustness; Power measurement; Wiring; CMOS-MEMS; accelerometer; torsional; z-axis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
  • Conference_Location
    Sanya
  • Print_ISBN
    978-1-4244-1907-4
  • Electronic_ISBN
    978-1-4244-1908-1
  • Type

    conf

  • DOI
    10.1109/NEMS.2008.4484502
  • Filename
    4484502