Title :
An integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional suspension
Author :
Qu, Hongwei ; Fang, Deyou ; Xie, Huikai
Author_Institution :
Dept. of Electr. & Comput. Eng., Oakland Univ., Rochester, MI
Abstract :
This paper presents an integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional sensing element. The sidewall capacitors formed by multiple CMOS interconnect metal layers are exploited for fully differential displacement sensing with a common-centroid wiring configuration. A deep reactive ion etching (DRIE) based micro-fabrication process with large processing tolerance has been developed to allow robust sensor structures and high fabrication yield. With a monolithically integrated low-power, low-noise, dual-chopper amplifier which has a measured 44.5 dB gain and 1 mW power consumption, the fabricated integrated z-axis accelerometer demonstrates a sensitivity of 320 mV/g and an overall noise floor of 110 mug/radicHz.
Keywords :
CMOS integrated circuits; accelerometers; micromechanical devices; sputter etching; CMOS-MEMS Z-axis accelerometer; deep reactive ion etching; differential displacement sensing; gain 44.5 dB; multiple CMOS interconnect metal layer; power 1 mW; torsional sensing element; Accelerometers; Capacitors; Etching; Fabrication; Gain measurement; Low-noise amplifiers; Noise measurement; Noise robustness; Power measurement; Wiring; CMOS-MEMS; accelerometer; torsional; z-axis;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Electronic_ISBN :
978-1-4244-1908-1
DOI :
10.1109/NEMS.2008.4484502