DocumentCode :
3236870
Title :
Lateral PNP BJT ESD protection devices
Author :
Vashchenko, V.A. ; LaFonteese, D.J. ; Korablev, K.G.
Author_Institution :
Nat. Semicond. Corp., Santa Clara, CA
fYear :
2008
fDate :
13-15 Oct. 2008
Firstpage :
53
Lastpage :
56
Abstract :
A new high voltage lateral PNP with sufficient current density for small footprint ESD protection is experimentally demonstrated in a 40 V drain-extended CMOS process. It is found that a lateral PNP device can exhibit snapback behavior similar to that characteristically associated with NPN-based ESD clamps. The mechanism leading to this effect is further studied for PNPs in a BiCMOS process using physical process and device simulation. This analysis reveals that the formation of a quasi-neutral electron-hole plasma in the N-base drift region reduces the base electric field and thus the emitter-collector voltage drop, explaining the observed behavior. The advantage of this lateral PNP is to provide local ESD protection that is robust against transient latch-up.
Keywords :
BiCMOS integrated circuits; CMOS integrated circuits; bipolar transistors; electrostatic discharge; BiCMOS process; N-base drift region; PNP BJT ESD protection devices; device simulation; drain-extended CMOS process; electric field; electrostatic discharge; emitter-collector voltage drop; quasi-neutral electron-hole plasma; transient latch-up; voltage 40 V; BiCMOS integrated circuits; CMOS process; Clamps; Current density; Electrostatic discharge; Plasma devices; Plasma properties; Plasma simulation; Protection; Voltage; ESD protection; breakdown; conductivity modulation; current instability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2008. BCTM 2008. IEEE
Conference_Location :
Monteray, CA
ISSN :
1088-9299
Print_ISBN :
978-1-4244-2725-3
Electronic_ISBN :
1088-9299
Type :
conf
DOI :
10.1109/BIPOL.2008.4662711
Filename :
4662711
Link To Document :
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