Title :
1997 2nd International Workshop on Statistical Metrology
Abstract :
The following topics were dealt with: statistical device characterization; variation statistics on circuit; process & equipment simulation/calibration; defect inspection; SPC and yield modeling
Keywords :
calibration; integrated circuit measurement; semiconductor process modelling; statistical analysis; SPC modeling; circuit statistical variations; defect inspection; equipment calibration; equipment simulation; process calibration; process simulation; statistical device characterization; statistical metrology; yield modeling;
Conference_Titel :
Statistical Metrology, 1997 2nd International Workshop on
Conference_Location :
Kyoto, Japan
Print_ISBN :
0-7803-3737-9
DOI :
10.1109/IWSTM.1997.629399
