DocumentCode :
3240373
Title :
Improving circuit speed through resin chemistry (a polycyanate resin for high speed PWB applications)
Author :
Wassberg, N.L. ; Bogan, G.W. ; Monnerat, G.A.
Author_Institution :
Dow Chemical USA, Freeport, TX, USA
fYear :
1989
fDate :
25-27 Sep 1989
Firstpage :
300
Lastpage :
306
Abstract :
The knowledge that low aromatic polymers promote improved dielectric response allowed the development of a polycyanate resin from a cycloaliphatic/aromatic hybrid. This product allows improvement in dielectric properties without reduction in the enhanced thermal properties associated with triazine resins. The cured polycyanate (containing cycloaliphatic bridges between aromatic rings) is capable of a low dielectric constant over a wide temperature and frequency range. The improved dielectric properties of this resin can promote circuit speed increases from 14 to 25%. The product also exhibits the thermal stability characteristics of triazine-type cures offering a glass transition temperature of 256°C. This cycloaliphatic/aromatic hybrid resin contributes both extremely low moisture absorption and relatively simple processing capabilities. The added benefit of low moisture absorption prevents the degradation of the dielectric and mechanical properties. This product appears well suited for applications where higher-speed components and excellent laminate heat stability are required
Keywords :
permittivity; polymers; printed circuits; 256 C; circuit speed increases; cycloaliphatic bridges between aromatic rings; cycloaliphatic/aromatic hybrid resin; glass transition temperature; high speed PWB applications; low dielectric constant; low moisture absorption; low permittivity; polycyanate resin; simple processing capabilities; thermal properties; thermal stability characteristics; Absorption; Bridge circuits; Chemistry; Circuit stability; Dielectric constant; Frequency; Moisture; Polymers; Resins; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1989, Proceedings. Seventh IEEE/CHMT International
Conference_Location :
San Francisco, CA
Type :
conf
DOI :
10.1109/EMTS.1989.68993
Filename :
68993
Link To Document :
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