DocumentCode
3244366
Title
Recovery of nanowire morphology and distribution by a computer vision-assisted approach
Author
Bao, Fen-ye ; Xuan, Jian-hua
Author_Institution
Dept. of Comput. Sci., Virginia Tech, Falls Church, VA, USA
fYear
2012
fDate
15-17 July 2012
Firstpage
38
Lastpage
44
Abstract
Nanomaterial has demonstrated its advantages in a variety of application fields such as biosensors and next-generation computer chips. It is important yet challenging to precisely capture and recover the morphological characteristics of nanomaterial for nanomanufacturing quality control. We propose a computer vision-assisted approach in this paper to recover the structural details of nanowires and their spatial distribution. First, we develop a geometric model for nanowire length measurement and a model calibration method based on statistical fitting to deal with bias. Second, we devise a morphology-based detection algorithm to identify nanowires from Scanning Electron Microscope (SEM) images in the presence of defects, and design a simple yet novel similarity function for correspondence establishment. The identified nanowires are fed into the geometric model to calculate their lengths. The experimental results show that our proposed method can effectively identify nanowires and establish correspondence with high detection accuracy and low false alarms in estimating lengths of a great number of nanowires on a substrate. Our approach can be readily integrated to assist nanomanufacturing and its quality control.
Keywords
computer vision; length measurement; nanofabrication; nanowires; production engineering computing; quality control; scanning electron microscopes; statistical distributions; SEM images; computer vision-assisted approach; false alarms; geometric model; model calibration method; morphological characteristics; morphology-based detection algorithm; nanomanufacturing quality control; nanomaterial; nanowire length measurement; nanowire morphology; scanning electron microscope images; similarity function; spatial distribution; statistical fitting; Accuracy; Dynamic programming; Feature extraction; Image edge detection; Image segmentation; Scanning electron microscopy; Substrates; Computer vision; Correspondence establishment; Morphology characterization; Nanomanufacturing; Nanowire detection;
fLanguage
English
Publisher
ieee
Conference_Titel
Wavelet Analysis and Pattern Recognition (ICWAPR), 2012 International Conference on
Conference_Location
Xian
ISSN
2158-5695
Print_ISBN
978-1-4673-1534-0
Type
conf
DOI
10.1109/ICWAPR.2012.6294752
Filename
6294752
Link To Document