Title :
Investigation of a mesh criterion for three-dimensional finite element diffusion simulation
Author :
Fleischmann, P. ; Haindl, B. ; Kosik, R. ; Selberherr, S.
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Austria
Abstract :
Three simple mesh examples are presented to show that neither Delaunay nor strictly non-obtuse mesh elements are required for a finite element diffusion computation. Mesh requirements based on a recently found condition are investigated to guarantee certain properties of the resulting stiffness matrix. The experiments are conducted using the general purpose solver AMIGOS
Keywords :
diffusion; finite element analysis; mathematical operators; mesh generation; semiconductor process modelling; 3D FEM simulation; AMIGOS; Delaunay mesh; Laplace operator; diffusion; discretization scheme; finite element diffusion computation; general purpose solver; mesh criterion; stiffness matrix; Clouds; Computational modeling; Finite element methods; Laplace equations; Microelectronics;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
4-930813-98-0
DOI :
10.1109/SISPAD.1999.799262
