DocumentCode :
3252181
Title :
A new 1T/2C merged two-terminal gain cell with SBT encapsulated floating gate MOSFET for highly scalable FeRAM
Author :
Aoki, M. ; Mushiga, M. ; Itoh, A. ; Eshita, T. ; Arimoto, Y.
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
fYear :
1999
fDate :
14-16 June 1999
Firstpage :
145
Lastpage :
146
Abstract :
We fabricated a new scalable gain cell that consists of one transistor (1T) and two ferroelectric capacitors (2C), and can select one individual cell using only two wires. The cell features an encapsulated floating gate MOSFET using SBT film and overlapped capacitors between the wire and the gate, thereby enabling simple high-level integration applicable for Gbit FeRAM. The fabricated prototype devices exhibit successful operation. The cell can write data at 5 V and read data at 2 V nondestructively, and retain data for 5000 s.
Keywords :
CMOS memory circuits; MOSFET; bismuth compounds; encapsulation; ferroelectric capacitors; ferroelectric storage; integrated circuit measurement; integrated memory circuits; random-access storage; strontium compounds; 1T/2C merged two-terminal gain cell; 2 V; 5 V; 5000 s; FeRAM; SBT encapsulated floating gate MOSFET; SBT film; SrBi/sub 2/Ta/sub 2/O/sub 4/; cell data read voltage; cell data write voltage; data retention; encapsulated floating gate MOSFET; high-level integration; individual cell selection; nondestructive read/write; one transistor-two ferroelectric capacitor structure; overlapped capacitor; prototype devices; scalable FeRAM; scalable gain cell; Ferroelectric films; Ferroelectric materials; MOS capacitors; MOSFET circuits; Nonvolatile memory; Polarization; Prototypes; Random access memory; Voltage; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1999. Digest of Technical Papers. 1999 Symposium on
Conference_Location :
Kyoto, Japan
Print_ISBN :
4-930813-93-X
Type :
conf
DOI :
10.1109/VLSIT.1999.799385
Filename :
799385
Link To Document :
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