Title :
Device equivalence of logic performance in 0.18 μm and extension to 0.13 μm embedded DRAM technology
Author :
Chakravarti, Satya N. ; Weaver, Rhys ; Iper, S.S.K. ; Hook, Terence ; Sierakowski, Andrej ; Winstel, Kevin ; Spieck, Juergen ; Prakash, D.P. ; Tian, Xiaowei ; Robson, Norman ; Wang, Helen ; Stillman, William ; Rice, James ; Flietner, Bertrand ; Jung, Le-T
Author_Institution :
Microelectron. Div., IBM Corp., Hopewell Junction, NY, USA
Abstract :
The embedded DRAM (eDRAM) technology can offer significant advantages in terms of performance and power consumption by combining a high bandwidth DRAM macro on the same chip as logic/analog circuits. However, it is a challenge for a device engineer to ensure that electrical parameters and performance of CMOS logic devices and SRAM yield are not compromised in the integration process and at the same time DRAM leakage and retention objectives are met. This paper reports a manufacturable 0.18 μm eDRAM technology, where this task has been successfully accomplished. The characteristics of logic and array devices operating from a power supply of 1.8 V are presented. The eDRAM logic device characteristics are compared with `logic-only´ (base) process devices and are found to be comparable. DRAM device characteristics, leakage and retention data measured on test structures are also shown which satisfy the temperature range of operation from 0°C to 105°C of the product
Keywords :
DRAM chips; integrated circuit testing; leakage currents; low-power electronics; 0 to 105 degC; 0.13 micron; 0.18 micron; 1.8 V; DRAM leakage; eDRAM; electrical parameters; embedded DRAM technology; logic device characteristics; power consumption; retention objectives; test structures; Analog circuits; Bandwidth; CMOS logic circuits; CMOS technology; Energy consumption; Logic arrays; Logic circuits; Logic devices; Power engineering and energy; Random access memory;
Conference_Titel :
VLSI Technology, Systems, and Applications, 2001. Proceedings of Technical Papers. 2001 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
0-7803-6412-0
DOI :
10.1109/VTSA.2001.934493