Title :
Novel technique for mechanical stresses determination in thin films
Author :
Emelyanov, V.A. ; Baranov, Valentine
Author_Institution :
Sci. Ind. Amalgamation, Minsk, Belarus
Abstract :
A novel technique for mechanical stresses determination in thin films has been proposed and tested for thin metal films on refractory metals basis. The new method provides the possibility of mechanical stresses distribution determination along of the films thickness. Experimental results concern films of Mo and alloys of Mo-Re deposited with a magnetron sputtering. Films material and sputtering conditions influence on a profile shape of the films fixed with SEM and on the total mechanical stresses values are described.
Keywords :
aluminium alloys; internal stresses; mechanical testing; metallic thin films; molybdenum alloys; rhenium alloys; scanning electron microscopy; silicon alloys; sputtered coatings; Mo-Re deposition; SEM; film thickness; magnetron sputtering; mechanical stress distribution; mechanical testing; refractory metals; thin metal films; Dielectric thin films; Microelectronics; Optical films; Semiconductor films; Semiconductor thin films; Silicon; Sputtering; Stress; Temperature; Transistors;
Conference_Titel :
Microelectronics, 2004. ICM 2004 Proceedings. The 16th International Conference on
Print_ISBN :
0-7803-8656-6
DOI :
10.1109/ICM.2004.1434760
