DocumentCode
3259176
Title
Semiconductor quantum well lasers with nanoscale resonant periodic active layers
Author
Coleman, J.J. ; Kim, J.D.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
fYear
2013
fDate
8-10 July 2013
Firstpage
17
Lastpage
18
Abstract
Quantum dot semiconductor lasers have been the subject of significant investigation for many years. In part this is for potential applications based on desirable properties when compared with traditional quantum well-based lasers such as ultra-low threshold current density and reduced temperature sensitivity. The most common technique for quantum dot growth is the self-assembly technique, in which dots form as a result of the large strain which exists between the dot material and substrate material. Unfortunately self-assembly results in dots with random positions and a broad size distribution. This leads to inhomogeneous broadening, decreased peak gain, and increased threshold current density. The lack of complete control over individual quantum dot properties inherent with the self-assembly technique has been the predominant obstacle to realizing their full potential for use in photonic devices.
Keywords
current density; laser beams; nanophotonics; quantum well lasers; self-assembly; broad size distribution; dot material; inhomogeneous broadening; nanoscale resonant periodic active layers; photonic devices; self-assembly; semiconductor quantum well lasers; substrate material; temperature sensitivity; ultralow threshold current density; Materials; Nanoscale devices; Quantum dot lasers; Quantum well lasers; Self-assembly; Threshold current;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Society Summer Topical Meeting Series, 2013 IEEE
Conference_Location
Waikoloa, HI
Print_ISBN
978-1-4673-5059-4
Type
conf
DOI
10.1109/PHOSST.2013.6614445
Filename
6614445
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