• DocumentCode
    3259642
  • Title

    Structure design of out-plane evanescent coupling accelerometer with sub-wavelength gratings

  • Author

    Baoyin Yao ; Lishuang Feng ; Zhen Zhou ; Wenpu Wang ; Xiao Wang ; Weifang Liu

  • Author_Institution
    Key Lab. of Micro-nano Meas.-Manipulation & Phys. (Minist. of Educ.), Beihang Univ., Beijing, China
  • fYear
    2013
  • fDate
    26-30 Aug. 2013
  • Firstpage
    287
  • Lastpage
    290
  • Abstract
    It is the key for MOEMS accelerometer to combine large mass, weak spring and sub-wavelength gratings in order to achieve high precision. A novel out-plane MOEMS accelerometer based on near-field evanescent waves coupling by means of variable period sub-wavelength gratings has been proposed. Structure parameters were optimized by finite element analysis to achieve high sensitivity in an ideal vibration mode. Based on the ANSYS simulation, the novel accelerometer is predicted to work in the first modal with displacement sensitivity at 2023 nm/G and measurement range of 0.3G, corresponding to 1st diffraction beam optical sensitivity 0.46%/mG. These results provide a theoretical basis for design and fabrication of out-plane MOEMS accelerometer with sub-wavelength gratings.
  • Keywords
    accelerometers; diffraction gratings; displacement measurement; fibre optic sensors; finite element analysis; light diffraction; micro-optomechanical devices; microfabrication; microsensors; vibration measurement; ANSYS simulation; diffraction beam optical sensitivity; displacement sensitivity; finite element analysis; near-field evanescent wave coupling; out-plane evanescent coupling MOEMS accelerometer; structure parameter design; variable period subwavelength grating; vibration mode; Accelerometers; Couplings; Gratings; Optical sensors; Optical surface waves; Sensitivity; Springs; Evnescent waves coupling; Finite element analysis; Optical MEMS accelerometer; Sub-wavelength gratings;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on
  • Conference_Location
    Suzhou
  • Print_ISBN
    978-1-4799-1210-0
  • Type

    conf

  • DOI
    10.1109/3M-NANO.2013.6737433
  • Filename
    6737433