Pulsed vacuum flashover of TiO2, Al2O3, Cr2O3 and their coextruded films on epoxy substrate

Author

Yonghong, Cheng ; Yu, Chen ; Jiabin, Zhou ; Guodong, Meng ; Yang, Bai ; Kai, Wu

Author_Institution

State Key Lab. of Electr. Insulation & Power Equip., Xian Jiaotong Univ., Xianning

fYear

2008

fDate

7-11 Sept. 2008

Firstpage

416

Lastpage

419

Abstract

Six kinds of thin films (TiO₂, Al₂O₃, Cr₂O₃, TiO₂/Al₂O₃, TiO₂/Cr₂O₃) were prepared on epoxy substrate using the method of reactive magnetron sputtering. Experiments on the single film, coextruded film, and partial oxidation film were carried out under fast pulse power supply (30 ns/400 ns, rise time and full width at half maximum time) in vacuum, and the flashover characteristics of six kinds of oxide films were studied.

Keywords

aluminium compounds; chromium compounds; dielectric thin films; extrusion; flashover; oxidation; semiconductor thin films; sputter deposition; titanium compounds; vacuum insulation; wide band gap semiconductors; Al₂O₃; Cr₂O₃; TiO₂; TiO₂-Al₂O₃; TiO₂-Cr₂O₃; coextruded film; epoxy substrate; oxide thin films; partial oxidation film; pulsed vacuum flashover; reactive magnetron sputtering; single oxide film; time 30 ns; time 400 ns; Aluminum oxide; Dielectrics and electrical insulation; Electron emission; Flashover; Photonic band gap; Pulsed power supplies; Sputtering; Substrates; Thermal conductivity; Vacuum breakdown;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Insulating Materials, 2008. (ISEIM 2008). International Symposium on

Conference_Location

Mie

Print_ISBN

978-4-88686-005-7

Electronic_ISBN

978-4-88686-006-4

Type

conf

DOI

10.1109/ISEIM.2008.4664574

Filename

4664574