Title :
Pulsed vacuum flashover of TiO2, Al2O3, Cr2O3 and their coextruded films on epoxy substrate
Author :
Yonghong, Cheng ; Yu, Chen ; Jiabin, Zhou ; Guodong, Meng ; Yang, Bai ; Kai, Wu
Author_Institution :
State Key Lab. of Electr. Insulation & Power Equip., Xian Jiaotong Univ., Xianning
Abstract :
Six kinds of thin films (TiO2, Al2O3, Cr2O3, TiO2/Al2O3, TiO2/Cr2O3) were prepared on epoxy substrate using the method of reactive magnetron sputtering. Experiments on the single film, coextruded film, and partial oxidation film were carried out under fast pulse power supply (30 ns/400 ns, rise time and full width at half maximum time) in vacuum, and the flashover characteristics of six kinds of oxide films were studied.
Keywords :
aluminium compounds; chromium compounds; dielectric thin films; extrusion; flashover; oxidation; semiconductor thin films; sputter deposition; titanium compounds; vacuum insulation; wide band gap semiconductors; Al2O3; Cr2O3; TiO2; TiO2-Al2O3; TiO2-Cr2O3; coextruded film; epoxy substrate; oxide thin films; partial oxidation film; pulsed vacuum flashover; reactive magnetron sputtering; single oxide film; time 30 ns; time 400 ns; Aluminum oxide; Dielectrics and electrical insulation; Electron emission; Flashover; Photonic band gap; Pulsed power supplies; Sputtering; Substrates; Thermal conductivity; Vacuum breakdown;
Conference_Titel :
Electrical Insulating Materials, 2008. (ISEIM 2008). International Symposium on
Conference_Location :
Mie
Print_ISBN :
978-4-88686-005-7
Electronic_ISBN :
978-4-88686-006-4
DOI :
10.1109/ISEIM.2008.4664574
