μ-PIXE, UV and FTIR spectroscopy studies of antioxidant depletion at the XLPE-semicon interfaces of HV cables

Author

Hinrichsen, P.F. ; Houdayer, A.J. ; Vicat, C. ; Parpal, J.-L. ; David, E. ; Roy, J. ; Paquin, L.

Author_Institution

Dept. de Phys., Montreal Univ., Que., Canada

fYear

1995

fDate

10-13 Jul 1995

Firstpage

685

Lastpage

689

Abstract

A systematic study of the depletion of antioxidant in the XLPE insulation adjacent to both the inner and the outer semicon in HV cables by μ-PIXE (Proton Induced X-ray Emission) to measure the distribution of sulphur, UV (at 288 nm) and FTIR (Fourier Transform Infra Red) absorption (at 3530 cm^-1 and 1735 cm^-1) has been made on ribbon and slice samples of HV cables. Significant depletion of the antioxidant, at both the inner and outer interfaces was observed, however, more than simple diffusion is generally required to reconcile the three types of data

Keywords

Fourier transform spectra; XLPE insulation; ion microprobe analysis; power cable insulation; semiconductor-insulator boundaries; spectrochemical analysis; μ-PIXE; 1735 cm^-1; 288 nm; 3530 cm^-1; FTIR spectroscopy; HV cables; UV spectroscopy; XLPE insulation; antioxidant depletion; ribbon samples; semiconductors; slice samples; Additives; Aging; Cable insulation; Electromagnetic wave absorption; Fourier transforms; Pollution measurement; Protons; Semiconductor device manufacture; Spatial resolution; Spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Conduction and Breakdown in Solid Dielectrics, 1995. ICSD'95., Proceedings of the 1995 IEEE 5th International Conference on

Conference_Location

Leicester

Print_ISBN

0-7803-2040-9

Type

conf

DOI

10.1109/ICSD.1995.523074

Filename

523074