DocumentCode
3264685
Title
Single electron transistors: modeling and fabrication
Author
Morris, James E. ; Wu, F. ; Radehaus, C. ; Hietschold, M. ; Henning, A. ; Hofmann, K. ; Kiesow, A.
Author_Institution
Dept. of Electr. & Comput. Eng., Portland State Univ., OR, USA
Volume
1
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
634
Abstract
Traditional conduction models for metal island films on insulating substrates are based on electrostatically activated tunneling, but underestimate actual conductances by orders of magnitude. A modified model has made significant headway with this problem, as demonstrated by simulations. The simplest discontinuous "film" is the single island coulomb block, which forms the basis of the single-electron transistor (SET). Room temperature SETs employ chains of islands, i.e. 1-D discontinuous films. The conventional numerical SET model is extended by application of the discontinuous thin film (DTF) work. Practical applications of discontinuous films are impeded by the difficulty of fabricating reproducible, stable structures, particularly for low TCR films which are the most susceptible to drift. Similar difficulties are experienced with SET islands, and a technique to manufacture stable and reproducible DTFs and SETs is described.
Keywords
semiconductor device models; single electron transistors; thin films; SET islands; discontinuous thin film; low TCR films; numerical SET model; room temperature SET; single electron transistors; single island coulomb block; Conductive films; Fabrication; Impedance; Insulation; Manufacturing; Numerical models; Single electron transistors; Substrates; Temperature; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1435085
Filename
1435085
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