DocumentCode :
3265085
Title :
Integrated Ferroelectric Technology For Nonvolatile
Author :
Sumi, Tatsumi
fYear :
1997
fDate :
3-5 June 1997
Firstpage :
157
Lastpage :
161
Keywords :
CMOS process; Conducting materials; EPROM; Electrodes; Ferroelectric materials; Nonvolatile memory; Random access memory; Stress; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Conference_Location :
Taipei, Taiwan
ISSN :
1524-766X
Print_ISBN :
0-7803-4131-7
Type :
conf
DOI :
10.1109/VTSA.1997.614749
Filename :
614749
Link To Document :
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