DocumentCode :
3269539
Title :
Present status and challenges of AlGaN/GaN HFETs
Author :
Nanishi, Yasushi
Author_Institution :
Dept. of Photonics, Ritsumeikan Univ., Shiga, Japan
Volume :
3
fYear :
2004
fDate :
18-21 Oct. 2004
Firstpage :
2230
Abstract :
This paper reviews the potential and present status of AlGaN/GaN HFETs. The high potential of these devices for high-power and high-frequency operation are explained from the view point of the unique physical properties of GaN and AlGaN/GaN hetero-structures. The present status of these device performances are briefly introduced. Over 200 W operation at 2 GHz and 5.3 W operation at 30 GHz have already been achieved so far, verifying the high-potential of this material system. Material issues for further improvements of these device performances are discussed.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; millimetre wave power transistors; power field effect transistors; wide band gap semiconductors; 2 GHz; 200 W; 30 GHz; 5.3 W; AlGaN-GaN; HFET; hetero-structures; high-frequency operation; high-power operation; Aluminum gallium nitride; Conducting materials; Electric breakdown; Gallium arsenide; Gallium nitride; HEMTs; Light emitting diodes; MODFETs; Optical materials; Piezoelectric polarization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
Type :
conf
DOI :
10.1109/ICSICT.2004.1435288
Filename :
1435288
Link To Document :
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