DocumentCode
327121
Title
Review on diamond based piezoresistive sensors
Author
Werner, Matthias ; Gluche, Peter ; Adamschik, Mario ; Kohn, Erhard ; Fecht, Hans-Jorg
Author_Institution
Dept. of Syst. Integration, VDI-VDE-Technol. Inf. GmbH, Teltow, Germany
Volume
1
fYear
1998
fDate
7-10 Jul 1998
Firstpage
147
Abstract
Nearterm industrial applications require pressure sensors and acceleration sensors which are able to operate at elevated temperatures and in harsh environments where conventional silicon devices do not work. Many properties of diamond (e.g. its physical hardness, high Young´s modulus, high tensile yield strength, chemical inertness, low coefficient of friction and high thermal conductivity) make diamond an excellent material for micromechanical device applications which include piezoresistive (e.g. pressure and acceleration) sensors. The measurement of the gauge factor of B-doped, polycrystalline CVD diamond thin films leads to the result that the longitudinal piezoresistive effect is larger than the transverse piezoresistive effect for all B-doping concentrations. Furthermore, the transverse piezoresistive effect shows a pronounced nonlinearity. Therefore, a “longitudinal” pressure sensor lay out should be preferred. In general, the longitudinal gauge factor increases with decreasing doping concentration and can be larger than 100, which is comparable to single-crystalline silicon, and larger than the reported gauge factors of SiC. First prototype pressure sensors with B-doped polycrystalline diamond piezoresistors connected to form a Wheatstone bridge on top of a silicon square membrane (1300 μm×1300 μm×30 μm) show an excellent linearity. The sensitivity of 1.64×10-5 mV/(V Pa)-1 can be improved using a lower doping concentration of the piezoresistors
Keywords
CVD coatings; acceleration; chemical vapour deposition; diamond; piezoresistive devices; pressure sensors; reviews; 1300 mum; 30 mum; Wheatstone bridge; Young´s modulus; acceleration sensors; chemical inertness; coefficient of friction; diamond; doping concentration; gauge factor; harsh environments; longitudinal piezoresistive effect; micromechanical device applications; physical hardness; piezoresistive sensors; polycrystalline CVD diamond thin films; pressure sensors; tensile yield strength; thermal conductivity; transverse piezoresistive effect; Acceleration; Chemical sensors; Chemical vapor deposition; Doping; Friction; Piezoresistance; Piezoresistive devices; Silicon devices; Temperature sensors; Thermal conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Industrial Electronics, 1998. Proceedings. ISIE '98. IEEE International Symposium on
Conference_Location
Pretoria
Print_ISBN
0-7803-4756-0
Type
conf
DOI
10.1109/ISIE.1998.707766
Filename
707766
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