DocumentCode
3271507
Title
Laterally-driven RF microswitch with high isolation
Author
Kamide, Sho ; Suzuki, Kenichiro
Author_Institution
Coll. of Sci. & Eng., Ritsumeikan Univ., Shiga, Japan
fYear
2005
fDate
25-28 Oct. 2005
Firstpage
212
Lastpage
213
Abstract
Most of MEMS microswitches that have been so far reported utilize a movable electrode moving vertically to a substrate. Especially, few researches have been made to apply a lateral motional MEMS microswitch to a high frequency range (above several GHz). Although the insertion loss is kept low in a wide range up to a high frequency, the isolation usually becomes worse with the increase of the signal frequency. We have improved the isolation in a high frequency by using lateral motion in mutually opposite directions. In addition, this lateral movement is effective to alleviate the adhesion of a contact area. We also consider about the feasibility of a silicon RF transmission line, which helps the process very easy because of keeping the overall structure simple. The microswitch under investigation has a simple structure and can be fabricated by the easy process. Its isolation is excellent as well as insertion loss even for a use in RF range. Rapid growing demands for more data traffic flow in mobile-phones and wireless LAN´s tend to use a higher frequency band. Although the current microswitch has several improvements left, its excellent feature will make it more useful near the future.
Keywords
isolation technology; microswitches; MEMS microswitches; RF microswitch; silicon RF transmission line; Contacts; Electrodes; Electrostatics; Insertion loss; Micromechanical devices; Microswitches; Radio frequency; Silicon; Switches; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN
4-9902472-2-1
Type
conf
DOI
10.1109/IMNC.2005.203813
Filename
1595289
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