DocumentCode :
3271734
Title :
E-beam data preparation method for forming ultra fine curved patterns in silicon microphotonic circuit
Author :
Watanabe, Toshifumi ; Tsuchizawa, Tai ; Yamada, Koji ; Fukuda, Hiroshi ; Itabashi, Seiichi
Author_Institution :
NTT Microsyst. Integration Labs., Atsugi, Japan
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
240
Lastpage :
241
Abstract :
We have developed a data preparation method for e-beam writers that improved their ability to fabricate ultra fine curved patterns.
Keywords :
electron beam lithography; integrated optics; silicon; E-beam data preparation method; Si; e-beam writers; silicon microphotonic circuit; ultra fine curved patterns; Coupling circuits; Integrated optics; Laboratories; Optical coupling; Optical fiber networks; Optical ring resonators; Optical waveguides; Shape; Silicon; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203827
Filename :
1595303
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3271734
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