DocumentCode :
3272672
Title :
Static and dynamic power management in 14nm FDSOI technology
Author :
Weber, O. ; Josse, E. ; Mazurier, J. ; Haond, M.
Author_Institution :
MINATEC, CEA-Leti, Grenoble, France
fYear :
2015
fDate :
1-3 June 2015
Firstpage :
1
Lastpage :
4
Abstract :
This work presents a 14nm technology designed for high speed and energy efficient applications using FDSOI transistors. -34% speed delay at same static power with -100mV Vdd supply voltage operation vs 28nm FDSOI is demonstrated. The specific FDSOI features for adjusting the threshold voltage and managing power are highlighted in this paper. It is shown that a light channel doping and reverse back bias are effective to reduce the static leakage and, on the other hand, forward back bias (FBB) can provide dynamic power saving at same speed. All this process & design techniques, in addition to the poly bias capability, makes FDSOI a highly flexible technology to maximize the speed/leakage/power compromise for each application product.
Keywords :
energy conservation; semiconductor doping; silicon-on-insulator; FBB; FDSOI transistor technology; dynamic power management; dynamic power saving; energy efficiency; fully depleted silicon on insulator; light channel doping; reverse back bias; size 14 nm; size 28 nm; static leakage reduction; static power management; voltage -100 mV; Delays; Doping; Logic gates; MOSFET; Threshold voltage; Back bias; Dynamic Power; Fully Depleted silicon-on-insulator (FDSOI) technology; Mismatch; Static power; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IC Design & Technology (ICICDT), 2015 International Conference on
Conference_Location :
Leuven
Type :
conf
DOI :
10.1109/ICICDT.2015.7165886
Filename :
7165886
Link To Document :
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