Title :
Cell Library Development Methodology for Throughput Enhancement of Electron Beam Direct-Write Lithography Systems
Author :
Sugihara, Makoto ; Takata, Taiga ; Nakamura, Kenta ; Inanami, Ryoichi ; Hayashi, Hiroaki ; Kishimoto, Katsumi ; Hasebe, Tetsuya ; Kawano, Yukihiro ; Matsunaga, Yusuke ; Murakami, Kazuaki ; Okumura, Katsuya
Author_Institution :
ISIT, Fukuoka
Abstract :
We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (integer linear programming)-based cell selection is proposed for EBDW systems in which both of the character projection (CP) and the variable shaped beam (VSB) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed to increase the number of cells on a CP aperture mask. Finally, a case study is shown in which the numbers of EB shots are examined under several cases.
Keywords :
electron beam lithography; integer programming; integrated circuit layout; integrated circuit manufacture; linear programming; semiconductor device manufacture; cell library development methodology; cell selection method; character projection; electron beam direct-write lithography systems; integer linear programming; throughput enhancement; variable shaped beam method; Apertures; Delay effects; Electron beams; Electronics industry; Libraries; Lithography; Production; Semiconductor devices; Shape; Throughput;
Conference_Titel :
System-on-Chip, 2005. Proceedings. 2005 International Symposium on
Conference_Location :
Tampere
Print_ISBN :
0-7803-9294-9
DOI :
10.1109/ISSOC.2005.1595663
