Title :
A Fast 2D Numerical Algorithm for Photolithography Applications
Author_Institution :
IBM East Fishkill facility
fDate :
31 May-1 Jun 1992
Keywords :
Analytical models; Bleaching; Circuit simulation; Equations; Light scattering; Lithography; Metrology; Optical scattering; Resists; Semiconductor device modeling;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on
Print_ISBN :
0-7803-0516-7
DOI :
10.1109/NUPAD.1992.673845
