Title :
Measuring the thermal diffusivity of CMOS chips
Author :
Kashmiri, S.M. ; Makinwa, K.A.A.
Author_Institution :
Electron. Instrum. Lab., Delft Univ. of Technol., Delft, Netherlands
Abstract :
This paper describes a new method for determining the effective value of the thermal diffusivity, D eff, of a CMOS chip. D eff is a parameter that describes the rate at which heat diffuses through a chip, and hence its knowledge is essential for the thermal management of systems on chip and the design of thermal sensors. By embedding an electrothermal filter (ETF) in a frequency-locked-loop (FLL), its phase response, which is determined by its (fixed) geometry and D eff, can be measured. D eff can then be accurately determined from the measured phase response. For an ETF implemented in a 0.7 ¿m CMOS process, the resulting values of D eff were 1.405, 0.755, and 0.495 cm2/s at -55, 27, and 125°C respectively.
Keywords :
CMOS integrated circuits; frequency locked loops; system-on-chip; thermal diffusivity; thermal management (packaging); thermal variables measurement; CMOS chips; electrothermal filter; frequency-locked-loop; size 0.7 mum; system-on-chip; temperature -55 degC; temperature 125 C; temperature 27 degC; thermal diffusivity measurement; thermal management; thermal sensors; Electrothermal effects; Frequency measurement; Knowledge management; Phase measurement; Semiconductor device measurement; Sensor phenomena and characterization; Sensor systems; System-on-a-chip; Thermal management; Thermal sensors;
Conference_Titel :
Sensors, 2009 IEEE
Conference_Location :
Christchurch
Print_ISBN :
978-1-4244-4548-6
Electronic_ISBN :
1930-0395
DOI :
10.1109/ICSENS.2009.5398125