DocumentCode
3280765
Title
An integrated reduced micromachined inertial measurement unit for land vehicle navigation
Author
Chang, Honglong ; Fu, Qianyan ; Shen, Qiang ; Xie, Jianbing ; Yuan, Weizheng
Author_Institution
Micro & Nano Electromech. Syst. Lab., Northwestern Polytech. Univ., Xi´´an, China
fYear
2011
fDate
20-23 Feb. 2011
Firstpage
201
Lastpage
204
Abstract
In this paper, a reduced micromachined inertial measurement unit (MIMU) was fabricated by a two-step selective SOI release process in order to meet the requirements of land vehicle navigation. In the process, the release process consists of two steps, i.e. dry release using notching effect and wet release using HF solution. Most area of the device was released in the dry etching process, but the boundaries of the proof mass and the suspension beams were not released until the wet etching. Through such a process configuration, the poor surface roughness on the bottom side of some important structures such as suspension beams was alleviated. While, the poor roughness on the bottom side of proof mass can alleviate the stiction effectively. The test results showed that the scale factors of the X/Y-axis accelerometer and Z-axis gyroscope were about 19.11 mV/g and 15.6mV/°/s at one atmosphere, respectively. The bias stability of the gyroscope was about 123.0deg/h with a resolution of 0.0151°/s/√Hz.
Keywords
accelerometers; gyroscopes; measurement systems; microfabrication; micromachining; navigation; silicon-on-insulator; HF solution; MIMU; X-Y-axis accelerometer; Z-axis gyroscope; dry etching process; integrated reduced micromachined inertial measurement unit; land vehicle navigation; notching effect; process configuration; proof mass; suspension beams; two-step selective SOI; wet etching; wet release; Accelerometers; Fabrication; Gyroscopes; Land vehicles; Navigation; Sensors; Suspensions; land vehicle navigation; notching effect; reduced MIMU; selective SOI release process;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location
Kaohsiung
Print_ISBN
978-1-61284-775-7
Type
conf
DOI
10.1109/NEMS.2011.6017329
Filename
6017329
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