DocumentCode :
3282656
Title :
Full 3D Process and Device Simulation for FinFET optimization
Author :
Nawaz, M. ; Haibach, P. ; Landgraf, E. ; Rösner, W. ; Städele, M. ; Luyken, R.J. ; Gencer, A.
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
40
Lastpage :
41
Keywords :
Analytical models; Annealing; Boron; Electrostatics; FinFETs; Implants; Oxidation; Semiconductor process modeling; Solid modeling; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1595966
Filename :
1595966
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3282656
