Title :
A New Etching Method For Single Crystal Al2O3 Film On Si Using Si Ion Implantation
Author :
Ishida, Makoto ; Kim, Hoon ; Kimura, Takayuki ; Nakamura, Tetsuro
Author_Institution :
Toyohashi Unliv of Technology
Keywords :
Acceleration; Actuators; Chemical vapor deposition; Crystallization; Etching; Ion implantation; Semiconductor films; Stability; Surface contamination; Voltage;
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
DOI :
10.1109/SENSOR.1995.717097