DocumentCode

329183

Title

Monitoring plasma over-etching of Wafer-bonded Microstructures

Author

Gupta, Raj K. ; Hsu, Charles H. ; Schmidt, M.A. ; Senturia, S.D.

Author_Institution

Massachusetts Institute of Technology

Volume

1

fYear

1995

fDate

25-29 Jun 1995

Firstpage

269

Lastpage

272

Keywords

Electrostatics; Material properties; Microstructure; Monitoring; Nuclear and plasma sciences; Plasma measurements; Residual stresses; Silicon; Testing; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on

Print_ISBN

91-630-3473-5

Type

conf

DOI

10.1109/SENSOR.1995.717168

Filename

717168