• DocumentCode
    3292893
  • Title

    Fabrication of self-aligned silicon field emitters coated with diamond-like carbon

  • Author

    Lee, Sanjo ; Lee, Sunnup ; Lee, Sungwoon ; Jeon, D. ; Lee, Kwang-Ryeol ; Ju, Byeong Kwon ; Myung Kwon Ju

  • Author_Institution
    Dept. of Phys., Myong Ji Univ., Seoul, South Korea
  • fYear
    1996
  • fDate
    7-12 Jul 1996
  • Firstpage
    283
  • Lastpage
    287
  • Abstract
    One of the basic challenges of the field emission display is the choice of material for field emission cathode. Metal tips have lower resistivity, higher thermal conductivity, and better hardness than semiconductor tips, but it is difficult to apply VLSI technology and thus make a large size display using metal tips. Semiconductors are good in terms of processing, but they are not the best material for field emission tips because of high resistivity, low thermal conductivity, poor hardness, and oxidized surface. Recently, the emission behavior of diamond-like carbon (DLC) is attracting a growing effort. Since the DLC film can be grown at low temperature and has most of the material properties of diamond, it can be a good alternative to diamond field emitters. In this paper, we report the field emission properties of the DLC film coated on silicon emitter tips. We have fabricated silicon field emitters, on which we coated DLC film. We have also attached a gate to the DLC-coated emitters using a self-aligned fabrication method
  • Keywords
    carbon; electron field emission; flat panel displays; semiconductor technology; silicon; vacuum microelectronics; C-Si; DLC film; Si field emitters; diamond-like carbon coating; field emission cathode; field emission display; field emission properties; self-aligned fabrication method; Cathodes; Conducting materials; Fabrication; Flat panel displays; Semiconductor films; Semiconductor materials; Silicon; Thermal conductivity; Thermal resistance; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
  • Conference_Location
    St. Petersburg
  • Print_ISBN
    0-7803-3594-5
  • Type

    conf

  • DOI
    10.1109/IVMC.1996.601825
  • Filename
    601825