• DocumentCode
    3293284
  • Title

    Modifications of fillet structures to form tip emitters

  • Author

    Fleming, J.G. ; King, Donald B. ; Talin, A.A. ; Felter, T. ; Malinowski, M.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    1996
  • fDate
    7-12 Jul 1996
  • Firstpage
    375
  • Lastpage
    379
  • Abstract
    In order to reduce the turn-on voltage of vacuum microelectronic devices, it is desirable that the field enhancement of the emitter be maximized. We have previously developed a gated manufacturable emitter process which uses fillets as emitters. Since tips have higher field enhancement then fillets we have tried to adapt our process to incorporate tip emitters. Two different approaches have been developed to try to achieve this goal. The first approach employs a sputter etch to form a tip on the end of a spike. Unfortunately, the tip formed is not sufficiently sharp enough to reduce the turn on voltage. In the second approach, the corners of a mold are sharpened during the deposition of the spacer material. The emitter material is then deposited and following the removal of the spacer, a very sharp tip remains
  • Keywords
    electron field emission; sputter etching; vacuum microelectronics; field enhancement; fillet structures; mold corners; spacer material; sputter etch; tip emitters; turn-on voltage; vacuum microelectronic devices; Amorphous materials; Fabrication; Laboratories; Lithography; Microelectronics; Silicon compounds; Sputter etching; Substrates; Tin; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
  • Conference_Location
    St. Petersburg
  • Print_ISBN
    0-7803-3594-5
  • Type

    conf

  • DOI
    10.1109/IVMC.1996.601845
  • Filename
    601845