DocumentCode :
3296231
Title :
Failure analysis of 200 nm-thick gold interconnects induced by alternating current
Author :
Zhang, G.P. ; Wang, M. ; Zhang, B.
Author_Institution :
Shenyang Nat. Lab. for Mater. Sci., Chinese Acad. of Sci., Shenyang, China
fYear :
2009
fDate :
6-10 July 2009
Firstpage :
777
Lastpage :
781
Abstract :
A testing system for evaluation of failure behavior of gold interconnects subjected to alternating current was established. Thermal fatigue in gold lines has been investigated by using alternating currents to generate cyclic temperatures and thermal strains. It is found that the lifetime versus thermal cyclic strain range (Deltaepsiv) for the 2 mum-wide Au interconnect follows the conventional Coffin-Manson relationship when Deltaepsiv les 0.47%, while when Deltaepsiv > 0.47%, the damage behavior of the Au lines is dominated by excessive Joule heating.
Keywords :
failure analysis; gold; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; thermal analysis; Au; Coffin-Manson relationship; Joule heating; alternating current; failure analysis; failure behavior evaluation; gold interconnection; microelectronic circuit lifetime; size 2 mum; thermal cyclic strain; Capacitive sensors; Failure analysis; Fatigue; Gold; Heating; Integrated circuit interconnections; Substrates; System testing; Temperature; Thermal expansion;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
ISSN :
1946-1542
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
Type :
conf
DOI :
10.1109/IPFA.2009.5232726
Filename :
5232726
Link To Document :
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