• DocumentCode
    3296446
  • Title

    Kinetic study of electromigration failure in Cr/Al-Cu thin film conductors covered with polyimide and the problem of the stress dependent activation energy

  • Author

    Lloyd, J.R. ; Shatzkes, M. ; Challener, D.C.

  • Author_Institution
    IBM, Hopewell Junction, NY, USA
  • fYear
    1988
  • fDate
    12-14 Apr 1988
  • Firstpage
    216
  • Lastpage
    225
  • Abstract
    The electromigration lifetime of Cr/Al-Cu conductors covered with polyimide passivation was studied as a function of temperature and current density. The activation energy for failure was found to be substantially higher than that found in studies of similar metals without polyimide. A current exponent of 2 was determined in the absence of temperature gradient failure. An improved method for calculating the activation energy for temperature gradient failure is described. The problem of the apparent stress-dependent activation energies is discussed
  • Keywords
    aluminium alloys; chromium; copper alloys; electromigration; failure analysis; metallic thin films; metallisation; passivation; Cr-AlCu thin film conductors; current density; current exponent; electromigration failure; electromigration lifetime; polyimide passivation; stress dependent activation energy; temperature gradient failure; Chromium; Conductive films; Conductors; Current density; Electromigration; Kinetic theory; Passivation; Polyimides; Stress; Temperature; Testing; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium 1988. 26th Annual Proceedings., International
  • Conference_Location
    Monterey, CA
  • Type

    conf

  • DOI
    10.1109/RELPHY.1988.23453
  • Filename
    23453