DocumentCode
3301131
Title
CMOS-based sensors
Author
Fedder, Gary K.
Author_Institution
Dept. of Electr. & Comput. Eng. & the Robotics Inst., Carnegie Mellon Univ., Pittsburgh, PA
fYear
2005
fDate
Oct. 30 2005-Nov. 3 2005
Abstract
This paper provides an overview of CMOS-based sensor technology with specific attention placed on devices made through micromachining of CMOS substrates and thin films. Microstructures may be formed using either pre-CMOS, intra-CMOS and post-CMOS fabrication approaches. To illustrate and motivate monolithic integration, a handful of microsystem examples, including inertial sensors, gravimetric chemical sensors, microphones, and a bone implantable sensor will be highlighted. Design constraints and challenges for CMOS-MEMS devices will be covered
Keywords
CMOS integrated circuits; micromachining; microsensors; substrates; thin films; CMOS fabrication approaches; CMOS-MEMS devices; bone implantable sensor; gravimetric chemical sensors; inertial sensors; micromachining; microphones; microstructures; microsystem; sensor technology; substrates; thin films; CMOS technology; Chemical sensors; Chemical technology; Fabrication; Micromachining; Microphones; Microstructure; Monolithic integrated circuits; Thin film devices; Thin film sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2005 IEEE
Conference_Location
Irvine, CA
Print_ISBN
0-7803-9056-3
Type
conf
DOI
10.1109/ICSENS.2005.1597652
Filename
1597652
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