DocumentCode
3301217
Title
InGaN-based multi-quantum well blue-violet light emitting diode
Author
Ali, Ahmad Hadi ; Abu Bakar, Ahmad Shuhaimi bin ; Hassan, Zainuriah
fYear
2012
fDate
5-7 Jan. 2012
Firstpage
1
Lastpage
2
Abstract
The InGaN-based multi-quantum well (MQW) blue-violet LED grown by metal organic chemical vapor deposition (MOCVD) was studied.The LED structure was grown on Si (111) substrate with AlN buffer layer, followed by 40 pairs of AIN/GaN intermediate layer with respective thickness of 5 nm and 20 nm. Subsequently, a 600 nm thick AlGaN/GaN strained-layer superlattices (SLSs) cladding underlayer was grown which consist of 120 pairs SLSs. Then, 60 nm GaN waveguide, 2.0 nm InGaN MQW active layer, 30 nm InGaN over layer and 10 nm GaN were deposited subsequently. Light emission characteristics from photoluminescence (PL) analysis show emission wavelength with main peak at 423 nm and intensity of 2725 x 103 a.u.
Keywords
III-V semiconductors; MOCVD; X-ray chemical analysis; X-ray diffraction; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; photoluminescence; quantum well devices; wide band gap semiconductors; InGaN-AlN-GaN; LED structure; MOCVD; MQW; Si; metal organic chemical vapor deposition; multiquantum well blue-violet light emitting diode; photoluminescence; size 10 nm; size 2.0 nm; size 20 nm; size 30 nm; size 5 nm; size 60 nm; size 600 nm; Gallium nitride; Light emitting diodes; Nanotechnology; Optical devices; Quantum well devices; X-ray diffraction; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Enabling Science and Nanotechnology (ESciNano), 2012 International Conference on
Conference_Location
Johor Bahru
Print_ISBN
978-1-4577-0799-5
Type
conf
DOI
10.1109/ESciNano.2012.6149695
Filename
6149695
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