• DocumentCode
    3302857
  • Title

    Normal incident SiGe/Si multiple quantum well infrared detector

  • Author

    Park, J.S. ; Karunasiri, R.P.G. ; Wang, K.L.

  • Author_Institution
    Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    749
  • Lastpage
    752
  • Abstract
    A long-wavelength ( approximately 10- mu m) quantum-well (QW) infrared detector with normal incident detection was fabricated using p-type Si/sub 1-x/Ge/sub x//Si multiple QWs. Photocurrent is measured as a function of the incident beam polarization. With a beam polarized parallel to the growth plane (90 degrees polarization, normal incidence), a photocurrent peak is observed at near 7.2 mu m with a full width at half maximum (FWHM) of about 80 meV. On the other hand, when the beam is polarized along the growth direction (0 degrees polarization), a peak is observed at near 8.6 mu m with FWHM of about 80 meV. With the non-optimized detector, the peak photoresponsivity of 0.3 A/W and detectivity of D* approximately 1.0*10/sup 9/cm square root Hz/W at 77 K are obtained for both polarizations. The results of normal incident detection demonstrate the feasibility of Si-based long-wavelength IR detectors and focal plane arrays with the advantage of monolithic integration with Si integrated circuits.<>
  • Keywords
    Ge-Si alloys; infrared detectors; light polarisation; semiconductor epitaxial layers; semiconductor quantum wells; silicon; 10 micron; MQW IR detector; SiGe-Si; detectivity; high polarization effect; incident beam polarization; long-wavelength IR detectors; normal incident detection; photocurrent; photoresponsivity; Electromagnetic wave absorption; Gallium arsenide; Germanium silicon alloys; Infrared detectors; Monolithic integrated circuits; Photoconductivity; Polarization; Quantum well devices; Sensor arrays; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235315
  • Filename
    235315