DocumentCode :
330608
Title :
Spatial And Temporal Radical Distribution In Inductively Coupled Plasma For SiO/sub 2/ Etching
Author :
Hayashi, S. ; Yamanaka, M. ; Kubota, M. ; Ogura, M.
Author_Institution :
Matsushita Electronics Corporation
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
10
Lastpage :
11
Keywords :
Etching; Fluorescence; Optical coupling; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Reflection; Spatial resolution; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729916
Filename :
729916
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330608
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