Dissociation Mechanism Of C₄F₈ In Parallel-Plate-Type RIE

Author

Hayashi, H. ; Morishita, S. ; Tatsumi, T. ; Hikosaka, Y. ; Noda, S. ; Nakagawa, H. ; Kobayashi, S. ; Inoue, M. ; Hoshino, T.

Author_Institution

Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies

fYear

1998

fDate

13-16 July 1998

Firstpage

Lastpage

Keywords

Argon; Density measurement; Electrons; Plasma density;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.729917

Filename

729917

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