DocumentCode :
330625
Title :
Improved Electron-Beam / DUV Intra-Level Mix-and-Match As A Production Viable Lithography With 100-nm Resolution
Author :
Magoshi, S. ; Niiyama, H. ; Sato, S. ; Kato, Y. ; Watanabe, Y. ; Shibata, T. ; Ito, M. ; Ando, A. ; Nakasugi, T. ; Sugihara, K. ; Okumura, K.
Author_Institution :
Toshiba Corporation
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
42
Lastpage :
43
Keywords :
Error correction; Indium tin oxide; Laboratories; Lithography; Microprocessors; Polynomials; Production; Resists; Throughput; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729947
Filename :
729947
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330625
