DocumentCode

330636

Title

OPC Methodology To Overcome Mask Error Effect On Below 0.25 um Lithography Generation

Author

Kim, Keeho ; Madhavan, Sriram ; Lilygren, John

Author_Institution

Cypress Semiconductor

fYear

1998

fDate

13-16 July 1998

Firstpage

64

Lastpage

65

Keywords

Character generation; Error correction; Inspection; Leakage current; Lithography; Manufacturing; Predictive models; Research and development; Testing; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729965

Filename

729965