Title :
A Design Of Beamline Optics For Large Field Exposure
Author :
Hasegawa, M. ; Gomei, Y. ; Hisatsugu, T.
Author_Institution :
Super fine SR Lithography Laboratory, ASET
Keywords :
Design optimization; Lithography; Mirrors; Optical beams; Optical design; Optical devices; Particle beam optics; Power distribution; Production; Shape;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730004
