Title :
A New Approach Of E-Beam Proximity Effect Correction For High-Resolution Applications
Author :
Simecek, M. ; Rosenbusch, A.
Author_Institution :
Sigma-C GmbH
Keywords :
Geometry; Linearity; Lithography; Microelectronics; Proximity effect; Scattering parameters;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730008
