DocumentCode

330671

Title

A New Approach Of E-Beam Proximity Effect Correction For High-Resolution Applications

Author

Simecek, M. ; Rosenbusch, A.

Author_Institution

Sigma-C GmbH

fYear

1998

fDate

13-16 July 1998

Firstpage

131

Lastpage

131

Keywords

Geometry; Linearity; Lithography; Microelectronics; Proximity effect; Scattering parameters;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730008

Filename

730008