DocumentCode

330673

Title

Simulation Of Electron Trajectory In The Cell-Projection Lithography Optical System

Author

Yamaguchi, K. ; Kotera, M.

Author_Institution

Osaka Institute of Technology

fYear

1998

fDate

13-16 July 1998

Firstpage

134

Lastpage

135

Keywords

Acceleration; Cathodes; Electrodes; Electron beams; Electron emission; Electron optics; Lenses; Lithography; Optical beams; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730010

Filename

730010