DocumentCode :
330688
Title :
Nanometer-scale Lithography Of The Ultrathin Films With Atomic Force Microscopy
Author :
Kim, Jinchul ; Lee, Haiwon ; Shin, Yongwoo ; Park, Sunwoo
Author_Institution :
Hanyang University
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
164
Lastpage :
165
Keywords :
Atomic force microscopy; Chemical engineering; Chemical processes; Lithography; Organic chemicals; Resists; Substrates; Surface resistance; Thermal force; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730025
Filename :
730025
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330688
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