DocumentCode
330704
Title
Fabrication Of Nanometric Aperture Arrays By Wet Anisotropic Etching For Near-Field Optical Memory Application
Author
Lee, M.B. ; Tsutsui, K. ; Ohtsu, M. ; Atoda, N.
Author_Institution
National Institute for Advanced Interdisciplinary Research
fYear
1998
fDate
13-16 July 1998
Firstpage
196
Lastpage
197
Keywords
Anisotropic magnetoresistance; Apertures; Geometrical optics; Lithography; Optical arrays; Optical device fabrication; Optical films; Optical recording; Probes; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730041
Filename
730041
Link To Document