DocumentCode
330728
Title
The Mechanism Of An Abnormal Stress Behavior Of HDPCVD Oxides On Metal-Patterned Wafer
Author
Lee, Soo Geun ; Park, Jong Wang ; Kim, Min ; Kim, Sun Rae ; Tae Wook Soo ; Chung, U-in ; Kang, Geung Won
Author_Institution
Samsung Electronics
fYear
1998
fDate
13-16 July 1998
Firstpage
251
Lastpage
252
Keywords
Compressive stress; Plasma applications; Plastic films; Research and development; Residual stresses; Semiconductor films; Substrates; Sun; Temperature; Tensile stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730066
Filename
730066
Link To Document