DocumentCode :
330728
Title :
The Mechanism Of An Abnormal Stress Behavior Of HDPCVD Oxides On Metal-Patterned Wafer
Author :
Lee, Soo Geun ; Park, Jong Wang ; Kim, Min ; Kim, Sun Rae ; Tae Wook Soo ; Chung, U-in ; Kang, Geung Won
Author_Institution :
Samsung Electronics
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
251
Lastpage :
252
Keywords :
Compressive stress; Plasma applications; Plastic films; Research and development; Residual stresses; Semiconductor films; Substrates; Sun; Temperature; Tensile stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730066
Filename :
730066
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330728
